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Cleaning Gases for Semiconductors Manufacturing Equipment

网上下注平台since completing a multi-purpose manufacturing facility for high-purity fluorine gases in 1988, we have consolidated our position as a major supplier of chlorine trifluoride and other cleaning gases for semiconductors manufacturing equipment.

*contact 网上下注平台 directly for more information.

ClF3

These are used as LP-CVD chamber cleaning gas.
网上下注平台These are used principally for 8-inch CVD apparatus.

Purity 99.9% or more
Packaging Cylinder (3.4L, 10L, 40L, 88L) Material: Stainless steel

Applications

  • LP-CVD chamber cleaning gas

20% diluted fluorine(20%F2/N2)

These are used as LP-CVD chamber cleaning gas.
These are used principally for 12-inch CVD apparatus.

Purity F2:99.9% or more
N2:99.999% or more
Packaging Cylinder (47L), Bundle Material: Manganese steel

Applications

  • LP-CVD chamber cleaning gas

Anhydrous hydrofluoric acid (HF)

these are used as lp-cvd chamber cleaning gas and etching gas.

Purity 99.999% or more
Packaging Cylinder (3.4L, 10L, 40L) Material: Stainless steel

Applications

  • Etching gas, LP-CVD chamber and exhaust pipe cleaning gas

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