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Photoresist Materials

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Product List

  • BTHB
  • BTHB-NB
  • MA-X-HFA
  • TFMA-BTHB-NB
  • 4-HFA-ST
  • 3,5-HFA-ST

Features of Fluorinated Monomers and Polymers for Photoresist Materials

  • High contact angle with water
  • Excellent transparency
  • High TMAH solubility
  • Low refractive index
  • High solubility

Product Introduction

we supply a variety of fluorine-containing monomers and polymers.

ArF Photoresist Pattern

75nm l/s

75nm c/h

80nm l/s

65nm l/s

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Research and Development
View our R&D activities.

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